Glycine-enhanced GaN Polishing Slurry

Doubles Removal Rate, Scratch-free

Glycine activated by abrasive friction boosts GaN polishing rate by 2.3 times over glycine-free slurries while yielding a scratch-free surface.

Ke, Congming · Shoulin, Liu · Yiao, Pang · Yongping, Wei · Wu, Yaping · Luo, Qiufa · Wu, Yueqin · Lu, Jing

Ceramics International 2024

Specifications

含甘氨酸抛光液材料去除率提高

{'zh': '2.3', 'en': ''} 倍

最高材料去除率

{'zh': '304.2', 'en': ''} nm/h

Ra nm

{'zh': '129.4', 'en': '3'} wt% K2S2O8