He/Ar Mixed Plasma Tungsten Fuzz

Suppresses physical sputtering

The porous nanostructure traps sputtered particles and reduces target erosion.

Yang, Kunru · Chen, Jiayang · Zu C.R. · Ni, Weiyuan · Liu, Dongping · Liu, Shengguang · Cui B. · Dai, Shuyu

Nuclear Materials and Energy 2024

Specifications

当绒层厚度

{'zh': '1500', 'en': ''} nm

Advantages

Under He/Ar mixed plasma irradiation, net physical sputtering mainly occurs in regions with local porosity larger than 0.6