1.48× EUV emission enhancement
Groove-confined plasma yields narrower 6.7 nm spectra and enhanced EUV output, offering a new route for next-generation lithography sources.
Qi-Jin, Zhang · Dou, Yinping · Yibin, Zhang · Wen, Zhilin · Chaohui, Wang · Ye, Fengwei · Song, Xiaowei · Xie, Zhuo · Lin, Jingquan
Vacuum 2024
Spectral width about two-thirds of flat target
EUV intensity enhancement ratio of 1.48
Higher plasma electron density than planar target