Atmospheric Pressure Plasma Jet

Plume enhancement mechanism

Reveals how jet-to-substrate distance affects plume luminous intensity and surface charge evolution, guiding optimization of plasma surface processing.

Wang, Guo · Zhang, Bo · Sun, Yuhao · Wenhu, Han · Zhang, Guanjun

Journal of Physics D: Applied Physics 2025

Specifications

Distribution diameter decreases

{'zh': '~16', 'en': '~2'} mm

Total charge decreases

{'zh': '~35', 'en': '~5'} nC

Advantages

Shortening jet-to-substrate distance enhances plume luminous intensity to varying degrees (rising and falling edges)

Peak density of deposited charge remains almost constant at distances below 8 mm