Fullerene ETL buffer layer

Kills buried-interface degradation

As a buffer layer between SnO₂ and perovskite, it scavenges superoxide radicals to suppress buried-interface degradation, reduces interfacial defect density, and accelerates charge transfer.

Liao, Ling · Chengrong, Wang · Jin, Bo · Guo, Zhicheng · Zhao, Yang · Zheng, Tian · Wenqi, Ge · Peng, Rufang

Journal of Materials Chemistry A 2025

Specifications

最大效率

{'zh': '22.17', 'en': ''} %

PCE

{'zh': '93', 'en': ''} %

Advantages

Decreased the density of interface defect states

Accelerated the transmission of photogenerated electrons