Single-Crystal GaN Polishing Slurry

3× Higher Removal Rate

Replacing water with glycine as the tribochemical mechanical polishing medium achieves simultaneous improvement in surface quality and removal rate on single-crystal gallium nitride substrates.

Ke, Congming · Shoulin, Liu · Zhang, Zongnan · Yiao, Pang · Wu, Yaping · Luo, Qiufa · Wu, Yueqin · Xu, Yangli · Lu, Jing

Applied Surface Science 2024

Specifications

材料去除率提升

{'zh': '3', 'en': ''} 倍

晶格畸变

{'zh': '0.4', 'en': ''} Å

甘氨酸转移电荷

{'zh': '0.202', 'en': ''} e