Laser-Induced Plasma-Assisted Ablation of Sapphire

72% higher etching efficiency

Enables efficient and controlled micromachining of sapphire by optimizing sacrificial target roughness and material.

Wen, Qiuling · Chen, Jinhong · Lu, Jing · Mu, Dekui · Jiang, Feng

Ceramics International 2023

Specifications

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Advantages

Plasma etching material removal rate is 72% higher than that of laser defocus ablation

Fe target yields the highest etching efficiency

Si target yields the best etching morphology