Etching-Free Electron Beam Lithography

Direct-write semiconductors in all-water

Eliminating dry etching or lift-off, this electron beam method directly writes diverse semiconductor nanopatterns onto silicon wafers from aqueous solutions.

Wang, Xiaohan · Dai, Xiao · Wang, Hao · Wang, Jiong · Chen, Qi · Chen, Fengnan · Yi, Qinghua · Tang, Rujun · Gao, Liang · Ma, Liang · Wang, Chen · Wang, Xiangyi · He, Guanglong · Fei, Yue · Guan, Yanqiu · Zhang, Biao · Dai, Yue · Tu, Xuecou · Zhang, Lijian · Zhang, Labao · Zou, Guifu

ACS Nano 2023

Specifications

氧化锌图形线宽

{'zh': '18', 'en': ''} nm

迁移率

{'zh': '3.94', 'en': ''} cm2 V-1

Advantages

Direct printing of metal oxides, sulfides, nitrides from aqueous solution